EUV Light Source by Laser Produced Plasma

Imaging Diagnostics of Debris from Double Pulse Laser-Produced Tin Plasma for EUV Light Source

The dynamics of debris from laser produced Tin (Sn) plasma was investigated for EUV light source. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were also investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation...

CO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography

High average power EUV light source has been the “most critical” issue in the research and development of the EUV lithography system in one decade. EUV LLC and International Sematech significantly stimulated the global research community to work seriously to advance plasma technology in achieving the goal of the EUV source, required by the semiconductor industry. It is instructive to look into ...

Radiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of Laser-Produced Plasma EUV Lithography Light Sources

Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extreme ultraviolet lithography (EUVL). Simulation of the dynamics and spectral properties of plasmas created in EUVL experiments plays a crucial role in analyzing and interpreting experimental measurements, and in optimizing the 13.5 nm radiation from the plasma source. Developing a good understanding...

High Efficiency Collector for Laser Plasma EUV Source

Effects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography

Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...